1

Stoichiometry determination of reactively sputtered titanium-silicide

H-O Blom, S Berg, M Ostling, S Petersson
Journal:
Vacuum
Year:
1982
Language:
english
File:
PDF, 220 KB
english, 1982
2

Dc-etching of poly-silicon with fluorine chemistry

H-O Blom, C Nender, S Berg, H Norström
Journal:
Vacuum
Year:
1988
Language:
english
File:
PDF, 451 KB
english, 1988
3

Controlled topography production—true 3D simulation and experiment

LB Jonsson, C Hedlund, IV Katardjiev, AM Barklund, H-O Blom, S Berg
Journal:
Vacuum
Year:
1995
Language:
english
File:
PDF, 1.06 MB
english, 1995
4

Superhigh-rate plasma jet etching of silicon

Bárdos, L., Berg, S., Blom, H-O.
Journal:
Applied Physics Letters
Year:
1989
Language:
english
File:
PDF, 504 KB
english, 1989
5

Predicting thin-film stoichiometry in reactive sputtering

Berg, S., Larsson, T., Nender, C., Blom, H-O.
Journal:
Journal of Applied Physics
Year:
1988
Language:
english
File:
PDF, 811 KB
english, 1988
6

Reactively sputtered titanium boride thin films

Blom, H-O.
Journal:
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Year:
1989
Language:
english
File:
PDF, 506 KB
english, 1989